Understanding command and control : future of command and control / David S. Alberts, Richard E. Hayes
Idioma: Inglês.Publicação: Washington, D.C. : CCRP Publications, 2006Descrição física: 244 p. : il.; 23 cmColeção: CCRP Publication SeriesISBN: 1893723178Assunto: 349374 | 234599Resumo: 1. Introduction. 2. Reader orientation. 3. Understanding. 4. Command and control. 5. C2 conceptual model overview. 6. C2 approaches. 7. Conceptual model: value view. 8. Conceptual model: process view. 9. Influences. 10. The way ahead. About the authors. Bibliography. Index. Catalog of CCRP publications.| Item type | Current location | Call number | Copy number | Status | Date due | Barcode |
|---|---|---|---|---|---|---|
| Monografias | Biblioteca da Polícia Judiciária | PJ21.C.99 (Browse shelf) | PJ32101 | Available | PJ132101 |
Também disponível em: https://www.dodccrp.org/files/Alberts_UC2.pdf [acedido em 17-08-2011].
1. Introduction. 2. Reader orientation. 3. Understanding. 4. Command and control. 5. C2 conceptual model overview. 6. C2 approaches. 7. Conceptual model: value view. 8. Conceptual model: process view. 9. Influences. 10. The way ahead. About the authors. Bibliography. Index. Catalog of CCRP publications.
There are no comments for this item.